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Electrical and optical parameters of Cu₆PS₅I-based thin films deposited using magnetron sputtering

机译:磁控溅射沉积Cu₆PS₅I基薄膜的电学和光学参数

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摘要

Cu₆PS₅I-based thin films were deposited onto silicate glass substrates by nonreactive radio-frequency magnetron sputtering. The chemical composition of thin films was determined using energy-dispersive X-ray spectroscopy. Electrical conductivity of Cu₆PS₅I-based thin films was studied as dependent on chemical composition. Optical transmission spectra of Cu₅.₄₆P₁.₆₈S₅.₀₆I₀.₈₀ thin film were investigated within the temperature interval 77…300 K; temperature behaviour of optical absorption spectra and dispersion of the refractive index were also studied. Temperature dependences of the energy position of absorption edge, Urbach energy and refractive index of Cu₅.₄₆P₁.₆₈S₅.₀₆I₀.₈₀ thin film have been analyzed.
机译:通过非反应性射频磁控溅射将Cu₆PS₅I基薄膜沉积到硅酸盐玻璃基板上。使用能量色散X射线光谱法确定薄膜的化学组成。研究了Cu₆PS₅I基薄膜的电导率,取决于其化学成分。研究了Cu₅.₄₆P₁.₆₈S₅.₀₆I₀.₈₀薄膜在77…300 K温度区间内的透射光谱。还研究了光吸收光谱的温度行为和折射率的色散。分析了Cu,P,S,S,I薄膜的吸收边缘能量位置,Urbach能量和折射率的温度依赖性。

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